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As the diagram on the right shows, the gallium (Ga+) primary ion beam hits the sample surface and sputters a small amount of material, which leaves the surface as either secondary ions (i+ or i−) or neutral atoms (n 0). The primary beam also produces secondary electrons (e −). As the primary beam rasters on the sample surface, the signal ...
A small ion beam rocket being tested by NASA. An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely ...
Ion beam analysis works on the basis that ion-atom interactions are produced by the introduction of ions to the sample being tested. Major interactions result in the emission of products that enable information regarding the number, type, distribution and structural arrangement of atoms to be collected.
The einzel lens principle in a simplified form was also used as a focusing mechanism in display and television cathode ray tubes, [3] [4] and has the advantage of providing a good sharply focused spot throughout the useful life of the tube's electron gun, with minimal or no readjustment needed (many monochrome TVs did not have or need focus controls), although in high-resolution monochrome ...
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
An electrostatic lens is a device that assists in the transport of charged particles. [1] [2] [3] For instance, it can guide electrons emitted from a sample to an electron analyzer, analogous to the way an optical lens assists in the transport of light in an optical instrument.
Photo: The MaMFIS operating at electron beam energy of up to 4 keV and electron current density of about 20 kA/cm 2. Main Magnetic Focus Ion Source (MaMFIS) is a compact ion source with extremely high electron current density. The device is designed for production of ions of arbitrary elements in any charge states, in particular, of highly ...
Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas.