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Titanium nitride (TiN; sometimes known as tinite) is an extremely hard ceramic material, often used as a physical vapor deposition (PVD) coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.
Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...
Typical coating thickness ca. (1 to 7) μm; One commercial coating type used to improve the wear resistance of tungsten carbide tools is the AlTiN-Saturn from Sulzer Metaplas. [6] The coatings are sometimes doped with at least one of the elements carbon, silicon, boron, oxygen and yttrium in order to improve selected properties for specific ...
ZrN grown by physical vapor deposition (PVD) is a light gold color similar to elemental gold. ZrN has a room-temperature electrical resistivity of 12.0 μΩ·cm, a temperature coefficient of resistivity of 5.6·10 −8 Ω·cm/K, a superconducting transition temperature of 10.4 K, and a relaxed lattice parameter of 0.4575 nm.
Aluminising vacuum chamber at Mont Mégantic Observatory used for re-coating telescope mirrors. [1] Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can ...
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Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
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