Search results
Results from the WOW.Com Content Network
A cleanroom or clean room is an engineered space that maintains a very low concentration of airborne particulates. It is well isolated, well controlled from contamination , and actively cleansed. Such rooms are commonly needed for scientific research and in industrial production for all nanoscale processes, such as semiconductor manufacturing.
The ceilings of semiconductor cleanrooms have fan filter units (FFUs) at regular intervals to constantly replace and filter the air in the cleanroom; semiconductor capital equipment may also have their own FFUs to clean air in the equipment's EFEM which allows the equipment to receive wafers in FOUPs. The FFUs, combined with raised floors with ...
A cleanroom suit, clean room suit, or bunny suit, [1] [2] is an overall garment worn in a cleanroom, an environment with a controlled level of contamination. One common type is an all-in-one coverall worn by semiconductor and nanotechnology line production workers, technicians, and process / equipment engineers.
The institute has about 370 employees, including 200 scientists and 30 students (2023). The total turnover in 2022 was 43,5 million Euro, including 24,6 million Euro funding. Wikimedia Commons has media related to Ferdinand-Braun-Institut .
Willis Whitfield (December 6, 1919 – November 12, 2012 [1] [2]) was an American physicist and inventor of the modern cleanroom, a room with a low level of pollutants used in manufacturing or scientific research. His invention earned him the nickname, "Mr. Clean," from Time Magazine. [3] [4]
In the microelectronics industry, a semiconductor fabrication plant, also called a fab or a foundry, is a factory where integrated circuits (ICs) are manufactured. [1]The cleanroom is where all fabrication takes place and contains the machinery for integrated circuit production such as steppers and/or scanners for photolithography, etching, cleaning, and doping.
SMIF POD for 6" wafers. SMIF (Standard Mechanical Interface) is a wafer carrier used in semiconductor wafer fabrication and cleanroom environments. The isolation technology was developed in the 1980s by a group known as the "micronauts" at Hewlett-Packard in Palo Alto. It is a SEMI standard. [1]
The method is named after Polish scientist Jan Czochralski, [1] who invented the method in 1915 while investigating the crystallization rates of metals. [2] He made this discovery by accident: instead of dipping his pen into his inkwell, he dipped it in molten tin, and drew a tin filament, which later proved to be a single crystal. [3]