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Mask data preparation (MDP), also known as layout post processing, is the procedure of translating a file containing the intended set of polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask. Typically, amendments and additions to the chip layout are performed in order to ...
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon ).
A benefit of using phase-shift masks in lithography is the reduced sensitivity to variations of feature sizes on the mask itself. This is most commonly used in alternating phase-shift masks, where the linewidth becomes less and less sensitive to the chrome width on the mask, as the chrome width decreases.
Layout view of a simple CMOS operational amplifier. In integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.
Coded apertures or coded-aperture masks are grids, gratings, or other patterns of materials opaque to various wavelengths of electromagnetic radiation. The wavelengths are usually high-energy radiation such as X-rays and gamma rays. A coded "shadow" is cast upon a plane by blocking radiation in a known pattern.
A modified uniformly redundant array (MURA) is a type of mask used in coded aperture imaging. They were first proposed by Gottesman and Fenimore in 1989. They were first proposed by Gottesman and Fenimore in 1989.
Spacer mask: first pattern; deposition; spacer formation by etching; first pattern removal; etching with spacer mask; final pattern. In spacer patterning, a spacer is a film layer formed on the sidewall of a pre-patterned feature. A spacer is formed by deposition or reaction of the film on the previous pattern, followed by etching to remove all ...
In a mask aligner, there is a one-to-one correspondence between the mask pattern and the wafer pattern. The mask covers the entire surface of the wafer which is exposed in its entirety in one shot. This was the standard for the 1:1 mask aligners that were succeeded by steppers and scanners with reduction optics. [4]