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  2. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    Aluminising vacuum chamber at Mont Mégantic Observatory used for re-coating telescope mirrors. [1] Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can ...

  3. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  4. Vapor–liquid–solid method - Wikipedia

    en.wikipedia.org/wiki/Vapor–liquid–solid_method

    One-dimensional crystalline nanowires are then grown by a liquid metal-alloy droplet-catalyzed chemical or physical vapor deposition process, which takes place in a vacuum deposition system. Au-Si droplets on the surface of the substrate act to lower the activation energy of normal vapor-solid growth.

  5. Evaporation (deposition) - Wikipedia

    en.wikipedia.org/wiki/Evaporation_(deposition)

    Evaporation is a common method of thin-film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel directly to the target object (substrate), where they condense back to a solid state. Evaporation is used in microfabrication, and to make macro-scale products such as metallized plastic film.

  6. Chemical vapor infiltration - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_infiltration

    However, the processing time is typically very long and the deposition rate is slow, so new routes have been invented to develop more rapid infiltration techniques: Thermal-gradient CVI with forced flow – In this process, a forced flow of gases and matrix material is used to achieve less porous and more uniformly dense material.

  7. Thermal laser epitaxy - Wikipedia

    en.wikipedia.org/wiki/Thermal_Laser_Epitaxy

    Thermal laser epitaxy (TLE) is a physical vapor deposition technique that utilizes irradiation from continuous-wave lasers to heat sources locally for growing films on a substrate. [1] [2] This technique can be performed under ultra-high vacuum pressure or in the presence of a background atmosphere, such as ozone, to deposit oxide films. [3]

  8. Chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_deposition

    Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films .

  9. Vacuum - Wikipedia

    en.wikipedia.org/wiki/Vacuum

    Other vacuum gauges can measure lower pressures, but only indirectly by measurement of other pressure-controlled properties. These indirect measurements must be calibrated via a direct measurement, most commonly a McLeod gauge. [40] The kenotometer is a particular type of hydrostatic gauge, typically used in power plants using steam turbines.

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