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2. Physical vapor deposition - Wikipedia

   en.wikipedia.org/wiki/Physical_vapor_deposition

   Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

3. Custom wheel - Wikipedia

   en.wikipedia.org/wiki/Custom_wheel

   Custom wheels come in many different finishes. The most common custom wheel finishes are Chrome, Polished and Painted. Chrome wheels consist of traditional chrome plating as well as the new process of PVD (Physical Vapor Deposition) Chrome. PVD chrome wheels are protected with a clear coat and are now being introduced by several wheel companies.

4. Surface finishing - Wikipedia

   en.wikipedia.org/wiki/Surface_finishing

   A #7 finish is produced by polishing with a 280–320 grit belt or wheel and sisal buffing with a cut and color compound. This is a semi-bright finish that will still have some polishing lines but they will be very dull. Carbon steel and iron are commonly polished to a #7 finish before chrome plating.

5. Titanium nitride - Wikipedia

   en.wikipedia.org/wiki/Titanium_nitride

   Titanium nitride (TiN; sometimes known as tinite) is an extremely hard ceramic material, often used as a physical vapor deposition (PVD) coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.

6. Vacuum deposition - Wikipedia

   en.wikipedia.org/wiki/Vacuum_deposition

   When the vapor source is a liquid or solid, the process is called physical vapor deposition (PVD), [3] which is used in semiconductor devices, thin-film solar panels, and glass coatings. [4] When the source is a chemical vapor precursor, the process is called chemical vapor deposition (CVD).

7. Sputter deposition - Wikipedia

   en.wikipedia.org/wiki/Sputter_deposition

   Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. [1] [2]