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  2. Multi-level cell - Wikipedia

    en.wikipedia.org/wiki/Multi-level_cell

    In 2013, Samsung introduced V-NAND (Vertical NAND, also known as 3D NAND) with triple-level cells, which had a memory capacity of 128 Gbit. [27] They expanded their TLC V-NAND technology to 256 Gbit memory in 2015, [24] and 512 Gbit in 2017. [28] Enterprise TLC (eTLC) is a more expensive variant of TLC that is optimized for commercial use.

  3. Charge trap flash - Wikipedia

    en.wikipedia.org/wiki/Charge_trap_flash

    Like the floating gate memory cell, a charge trapping cell uses a variable charge between the control gate and the channel to change the threshold voltage of the transistor. The mechanisms to modify this charge are relatively similar between the floating gate and the charge trap, and the read mechanisms are also very similar.

  4. Flash memory - Wikipedia

    en.wikipedia.org/wiki/Flash_memory

    In July 2016, Samsung announced the 4 TB [clarification needed] Samsung 850 EVO which utilizes their 256 Gbit 48-layer TLC 3D V-NAND. [183] In August 2016, Samsung announced a 32 TB 2.5-inch SAS SSD based on their 512 Gbit 64-layer TLC 3D V-NAND. Further, Samsung expects to unveil SSDs with up to 100 TB of storage by 2020. [184]

  5. List of 7400-series integrated circuits - Wikipedia

    en.wikipedia.org/wiki/List_of_7400-series...

    triple 3-input NAND gate 14 SN74LS10: 74x11 3 triple 3-input AND gate 14 SN74LS11: 74x12 3 triple 3-input NAND gate open-collector 14 SN74LS12: 74x13 2 dual 4-input NAND gate Schmitt trigger: 14 SN74LS13: 74x14 6 hex inverter gate Schmitt trigger 14 SN74LS14: 74x15 3 triple 3-input AND gate open-collector 14 SN74LS15: 74x16 6 hex inverter gate

  6. Multiple patterning - Wikipedia

    en.wikipedia.org/wiki/Multiple_patterning

    Planar NAND flash had several layers which use SADP below 80 nm pitch and SAQP below 40 nm pitch. 3D NAND flash used SADP for some layers. While it does not scale so aggressively laterally, the use of string stacking in 3D NAND would imply the use of multiple patterning (litho-etch style) to pattern the vertical channels.

  7. List of semiconductor scale examples - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    Ambarella Inc. announced the availability of the A7L system-on-a-chip circuit for digital still cameras, providing 1080p60 high-definition video capabilities in September 2011 [110] Chips using 24–28 nm technology

  8. IBM FlashSystem - Wikipedia

    en.wikipedia.org/wiki/IBM_FlashSystem

    The MicroLatency flash modules were updated to 32-layer 3D TLC NAND flash from Micron. Rather than the compression feature slowing down data access as usually happens with software based compression, the 900 continued to advertise 1.2 million I/O operations per second (IOPs) due to the hardware compression implementation and hardware only data ...

  9. Three-dimensional integrated circuit - Wikipedia

    en.wikipedia.org/wiki/Three-dimensional...

    There are several methods for 3D IC design, including recrystallization and wafer bonding methods. There are two major types of wafer bonding, Cu-Cu connections (copper-to-copper connections between stacked ICs, used in TSVs) [18] [19] and through-silicon via (TSV). 3D ICs with TSVs may use solder microbumps, small solder balls as an interface between two individual dies in a 3D IC. [20]

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