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  2. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    Adherence is the adhesive strength between photoresist and substrate. If the resist comes off the substrate, some features will be missing or damaged. Etching resistance Anti-etching is the ability of a photoresist to resist the high temperature, different pH environment or the ion bombardment in the process of post-modification. Surface tension

  3. KPR - Wikipedia

    en.wikipedia.org/wiki/KPR

    It is also resistant to acid, ferric chloride and other chemicals used to etch metals. The fundamental method of its use was first described in two US Patents, USP 2610120 [1] and USP 2670287, [2] assigned to the Eastman Kodak Company of Rochester, New York. These photo-resistant resins are formed from cinnamic acid esters, with the most ...

  4. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  5. Ground (etching) - Wikipedia

    en.wikipedia.org/wiki/Ground_(etching)

    A metal etching plate is a piece of sheet metal, usually copper, zinc, steel, or aluminium. The ground resists the acid or mordant which is used for etching, protecting areas of the metal plate. The ground resists the acid or mordant which is used for etching, protecting areas of the metal plate.

  6. Reo, Indiana - Wikipedia

    en.wikipedia.org/wiki/Reo,_Indiana

    Reo is an unincorporated community and census-designated place in Ohio Township, Spencer County, in the U.S. state of Indiana. [1] The name Reo was coined in 1966 as an acronym of three nearby larger cities: Rockport, Indiana, Evansville, Indiana, and Owensboro, Kentucky. [2]

  7. Resist - Wikipedia

    en.wikipedia.org/wiki/Resist

    Etching processes use a resist, though in these typically the whole object is covered in the resist (called the "ground" in some contexts), which is then selectively removed from some parts. This is the case when a resist is used to prepare the copper substrate for champlevé enamels , where parts of the field are etched (with acid or ...

  8. Etching - Wikipedia

    en.wikipedia.org/wiki/Etching

    ferric chloride may be used for etching copper or zinc plates, whereas nitric acid may be used for etching zinc or steel plates. Typical solutions are 1 part FeCl 3 to 1 part water and 1 part nitric to 3 parts water. The strength of the acid determines the speed of the etching process. The etching process is known as biting (see also spit ...

  9. Lift-off (microtechnology) - Wikipedia

    en.wikipedia.org/wiki/Lift-off_(microtechnology)

    Lift-off is applied in cases where a direct etching of structural material would have undesirable effects on the layer below. Lift-off is a cheap alternative to etching in a research context, which permits a slower turn-around time. Finally, lifting off a material is an option if there is no access to an etching tool with the appropriate gases.

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