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The focused ion beam has become a powerful tool for site-specific 3D imaging of sub-micron features in a sample. In this FIB tomography technique, the sample is sequentially milled using an ion beam perpendicular to the specimen while imaging the newly exposed surface using an electron beam.
Ion beam analysis works on the basis that ion-atom interactions are produced by the introduction of ions to the sample being tested. Major interactions result in the emission of products that enable information regarding the number, type, distribution and structural arrangement of atoms to be collected.
Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas.
An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
As the helium ion beam interacts with the sample, it does not suffer from a large excitation volume, and hence provides sharp images with a large depth of field on a wide range of materials. Compared to a SEM, the secondary electron yield is quite high, allowing for imaging with currents as low as 1 femtoamp. The detectors provide information ...
Particle-Induced X-Ray Emission or Proton-Induced X-Ray Emission (PIXE) is a technique used for determining the elemental composition of a material or a sample.When a material is exposed to an ion beam, atomic interactions occur that give off EM radiation of wavelengths in the x-ray part of the electromagnetic spectrum specific to an element.
Implementation of an einzel lens showing the ion path. Six plates are parallel to the ion flight path with the middle plate at a particular potential. An einzel lens (from German: Einzellinse – single lens [1]), or unipotential lens, [2] is a charged particle electrostatic lens that focuses without changing the energy of the beam. It consists ...
The first step in ion sculpting is to make either a through hole or a blind hole (not penetrating completely), most commonly using a focused ion beam (FIB). The holes are commonly about 100 nm in diameter, but can be made much smaller. This step may or may not be done at room temperature, with a low temperature of -120 C. Next, three common ...