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Evaporation is a common method of thin-film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel directly to the target object (substrate), where they condense back to a solid state. Evaporation is used in microfabrication, and to make macro-scale products such as metallized plastic film.
The basic form of a 2-dimensional thin film equation is [3] [4] [5] = where the fluid flux is = [(+ ^) + ^] +, and μ is the viscosity (or dynamic viscosity) of the liquid, h(x,y,t) is film thickness, γ is the interfacial tension between the liquid and the gas phase above it, is the liquid density and the surface shear.
PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation. PVD is used in the manufacturing of items which require thin films for optical, mechanical, electrical, acoustic or chemical ...
Vacuum Sugar Apparatus at The Great Exhibition, 1851. Vacuum evaporation is the process of causing the pressure in a liquid-filled container to be reduced below the vapor pressure of the liquid, causing the liquid to evaporate at a lower temperature than normal.
Thin-film deposition is a process applied in the semiconductor industry to grow electronic materials, in the aerospace industry to form thermal and chemical barrier coatings to protect surfaces against corrosive environments, in optics to impart the desired reflective and transmissive properties to a substrate and elsewhere in industry to modify surfaces to have a variety of desired properties.
Atomic-layer CVD – Deposits successive layers of different substances to produce layered, crystalline films. See Atomic layer epitaxy. Combustion chemical vapor deposition (CCVD) – Combustion Chemical Vapor Deposition or flame pyrolysis is an open-atmosphere, flame-based technique for depositing high-quality thin films and nanomaterials.
Molecular-beam epitaxy (MBE) is an epitaxy method for thin-film deposition of single crystals. MBE is widely used in the manufacture of semiconductor devices , including transistors . [ 1 ] MBE is used to make diodes and MOSFETs (MOS field-effect transistors ) at microwave frequencies, and to manufacture the lasers used to read optical discs ...
Thin films may be deposited by evaporating a substance and condensing it onto a substrate, or by dissolving the substance in a solvent, spreading the resulting solution thinly over a substrate, and evaporating the solvent. The Hertz–Knudsen equation is often used to estimate the rate of evaporation in these instances.