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Colorado Ultraviolet Transit Experiment (CUTE) is a small UV space telescope to study selected exoplanets. [1] It was launched as a rideshare on the Atlas V that launched Landsat 9 on September 27, 2021. [1] Designed to operate for at least 8 months and study 10 exoplanets, CUTE remains operational as of December 2023, 27 months after launch.
UV observations can also provide essential information about the evolution of galaxies. They can be used to discern the presence of a hot white dwarf or main sequence companion in orbit around a cooler star. [3] [4] The ultraviolet universe looks quite different from the familiar stars and galaxies seen in visible light.
GALEX used the first ever UV light dichroic beam-splitter flown in space to direct photons to the Near UV (175–280 nanometers) and Far UV (135–174 nanometers) microchannel plate detectors. Each of the two detectors has a 65 mm (2.6 in) diameter. The target orbit is 670 km (420 mi) circular and inclined at 29.00° to the equator.
Rough plot of Earth's atmospheric transmittance (or opacity) to various wavelengths of electromagnetic radiation, including visible light.. The optical window is the portion of the optical spectrum that is not blocked by the Earth's atmosphere.
Space telescopes that collect particles, such as cosmic ray nuclei and/or electrons, as well as instruments that aim to detect gravitational waves, are also listed. Missions with specific targets within the Solar System (e.g., the Sun and its planets ), are excluded; see List of Solar System probes for these, and List of Earth observation ...
Extremely hot stars (such as O- and B-type) emit proportionally more UV radiation than the Sun. Sunlight in space at the top of Earth's atmosphere (see solar constant) is composed of about 50% infrared light, 40% visible light, and 10% ultraviolet light, for a total intensity of about 1400 W/m 2 in vacuum.
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Extreme ultraviolet composite image of the Sun (red: 21.1 nm, green: 19.3 nm, blue: 17.1 nm) taken by the Solar Dynamics Observatory on August 1, 2010 13.5 nm extreme ultraviolet light is used commercially for photolithography as part of the semiconductor fabrication process.