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  2. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    Aluminising vacuum chamber at Mont Mégantic Observatory used for re-coating telescope mirrors. [1] Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can ...

  3. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  4. Vapor–liquid–solid method - Wikipedia

    en.wikipedia.org/wiki/Vapor–liquid–solid_method

    The VLS process takes place as follows: A thin (~1–10 nm) Au film is deposited onto a silicon (Si) wafer substrate by sputter deposition or thermal evaporation. The wafer is annealed at temperatures higher than the Au-Si eutectic point, creating Au-Si alloy droplets on the wafer surface (the thicker the Au film, the larger the droplets).

  5. Evaporation (deposition) - Wikipedia

    en.wikipedia.org/wiki/Evaporation_(deposition)

    Evaporation is a common method of thin-film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel directly to the target object (substrate), where they condense back to a solid state. Evaporation is used in microfabrication, and to make macro-scale products such as metallized plastic film.

  6. Chemical vapor infiltration - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_infiltration

    However, the processing time is typically very long and the deposition rate is slow, so new routes have been invented to develop more rapid infiltration techniques: Thermal-gradient CVI with forced flow – In this process, a forced flow of gases and matrix material is used to achieve less porous and more uniformly dense material.

  7. Chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_deposition

    Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films .

  8. Carbon film (technology) - Wikipedia

    en.wikipedia.org/wiki/Carbon_film_(technology)

    Carbon films are produced by deposition using gas-phase deposition processes, in most cases taking place in a vacuum: chemical vapor deposition, CVD or physical vapor deposition, PVD. They are deposited in the form of thin films with film thicknesses of just a few micrometres .

  9. Vacuum distillation - Wikipedia

    en.wikipedia.org/wiki/Vacuum_distillation

    Vacuum distillation is often used in large industrial plants as an efficient way to remove salt from ocean water, in order to produce fresh water. This is known as desalination. The ocean water is placed under a vacuum to lower its boiling point and has a heat source applied, allowing the fresh water to boil off and be condensed.