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  2. Plasma cutting - Wikipedia

    en.wikipedia.org/wiki/Plasma_cutting

    Plasma cutting. Plasma cutting is a process that cuts through electrically conductive materials by means of an accelerated jet of hot plasma. Typical materials cut with a plasma torch include steel, stainless steel, aluminum, brass and copper, although other conductive metals may be cut as well. Plasma cutting is often used in fabrication shops ...

  3. Plasma globe - Wikipedia

    en.wikipedia.org/wiki/Plasma_globe

    A plasma ball with filaments extending between the inner and outer spheres. A plasma ball, plasma globe, or plasma lamp is a clear glass container filled with noble gases, usually a mixture of neon, krypton, and xenon, that has a high-voltage electrode in the center of the container. When voltage is applied, a plasma is formed within the container.

  4. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine -bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process ...

  5. Plasma (physics) - Wikipedia

    en.wikipedia.org/wiki/Plasma_(physics)

    The plasma approximation: The plasma approximation applies when the plasma parameter Λ, [26] representing the number of charge carriers within the Debye sphere is much higher than unity. [ 19 ] [ 20 ] It can be readily shown that this criterion is equivalent to smallness of the ratio of the plasma electrostatic and thermal energy densities.

  6. Plasma ashing - Wikipedia

    en.wikipedia.org/wiki/Plasma_ashing

    In semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from an etched wafer. Using a plasma source, a monatomic (single atom) substance known as a reactive species is generated. Oxygen or fluorine are the most common reactive species. Other gases used are N2/H2 where the H2 portion is 2 ...

  7. Plasma-enhanced chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Plasma-enhanced_chemical...

    PECVD machine at LAAS technological facility in Toulouse, France. Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases.

  8. Plasma torch - Wikipedia

    en.wikipedia.org/wiki/Plasma_torch

    Plasma torch. A plasma torch cutter. A plasma torch (also known as a plasma arc, plasma gun, plasma cutter, or plasmatron) is a device for generating a directed flow of plasma. [1][2][3] The plasma jet can be used for applications including plasma cutting, plasma arc welding, plasma spraying, and plasma gasification for waste disposal. [4]

  9. Tesla coil - Wikipedia

    en.wikipedia.org/wiki/Tesla_coil

    The Tesla coil (L1, L2), an air-core double-tuned resonant transformer, which generates the high output voltage. Optionally, a capacitive electrode (top load) (E) in the form of a smooth metal sphere or torus attached to the secondary terminal of the coil. Its large surface area suppresses premature air breakdown and arc discharges, increasing ...

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