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  2. Plasma cutting - Wikipedia

    en.wikipedia.org/wiki/Plasma_cutting

    Plasma cutting. Plasma cutting is a process that cuts through electrically conductive materials by means of an accelerated jet of hot plasma. Typical materials cut with a plasma torch include steel, stainless steel, aluminum, brass and copper, although other conductive metals may be cut as well. Plasma cutting is often used in fabrication shops ...

  3. Plasma-enhanced chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Plasma-enhanced_chemical...

    PECVD machine at LAAS technological facility in Toulouse, France. Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases.

  4. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine -bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process ...

  5. Plasma globe - Wikipedia

    en.wikipedia.org/wiki/Plasma_globe

    A plasma ball with filaments extending between the inner and outer spheres. A plasma ball, plasma globe, or plasma lamp is a clear glass container filled with noble gases, usually a mixture of neon, krypton, and xenon, that has a high-voltage electrode in the center of the container. When voltage is applied, a plasma is formed within the container.

  6. Spherical Tokamak for Energy Production - Wikipedia

    en.wikipedia.org/wiki/Spherical_Tokamak_for...

    Spherical Tokamak for Energy Production (STEP) is a spherical tokamak fusion plant concept proposed by the United Kingdom Atomic Energy Authority (UKAEA) and funded by the UK government. [ 1 ] [ 2 ] [ 3 ] The project is a proposed DEMO -class successor device to the ITER tokamak proof-of-concept of a fusion plant, the most advanced tokamak ...

  7. Dry etching - Wikipedia

    en.wikipedia.org/wiki/Dry_etching

    Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of reactive gases such as fluorocarbons, oxygen, chlorine, boron trichloride; sometimes with addition of nitrogen, argon, helium and other gases) that dislodge portions of the material from the exposed surface.

  8. Plasma (physics) - Wikipedia

    en.wikipedia.org/wiki/Plasma_(physics)

    The plasma approximation: The plasma approximation applies when the plasma parameter Λ, [26] representing the number of charge carriers within the Debye sphere is much higher than unity. [ 19 ] [ 20 ] It can be readily shown that this criterion is equivalent to smallness of the ratio of the plasma electrostatic and thermal energy densities.

  9. Plasma propulsion engine - Wikipedia

    en.wikipedia.org/wiki/Plasma_propulsion_engine

    A plasma propulsion engine is a type of electric propulsion that generates thrust from a quasi-neutral plasma. This is in contrast with ion thruster engines, which generate thrust through extracting an ion current from the plasma source, which is then accelerated to high velocities using grids/ anodes. These exist in many forms (see electric ...

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