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Laurell Technologies WS-400 spin coater used to apply photoresist to the surface of a silicon wafer. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material in liquid form is applied on the center of the substrate, which is either spinning at low speed or not spinning at all.
A fluid reservoir to store the main supply of coating fluid for the system; A pump to drive the coating fluid through the system; A slot-die to distribute the coating fluid across the desired coating width before coating onto the substrate; A substrate mounting system to support the substrate in a controlled manner as it moves through the system
Since the foundation of the company GMA in 1989, which emerged from the former Elektromat, in Sacka near Dresden, Suss Microtec has been producing its own systems for testing micro components. In 1993, Suss Microtec expanded its product range with the acquisition of the French S.E.T. to include spin coaters and device bonders.
There are four basic parameters that are involved in spin coating: solution viscosity, solid content (density), angular speed, and spin time. [13] A range of thicknesses can be achieved by spin coating. Most commonly the thicknesses range from 1-200 μm. The main properties that affect the thickness of the film are viscosity and spin speed.
Aluminising vacuum chamber at Mont Mégantic Observatory used for re-coating telescope mirrors. [1] Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can ...
The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. As suggested by the name compounded from them, photolithography is a printing method (originally based on the use of limestone printing plates) in which light plays an essential role.
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