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  2. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    PVD process flow diagram. Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from ...

  3. Electromagnetically enhanced Physical Vapor Deposition

    en.wikipedia.org/wiki/Electromagnetically...

    EPVD technology was developed by Paradigm Shift Technologies, Inc., a Canadian company founded in 1995. It was invented to replace the traditional chrome plating. [1]Thin-film deposition is the overarching technology from which PVD, CVD, ALD, EBPVD, and EPVD are derived, each employing different methods to achieve specific coating characteristics.

  4. Chrome plating - Wikipedia

    en.wikipedia.org/wiki/Chrome_plating

    Trivalent chromium plating, also known as tri-chrome, Cr 3+, and chrome(III) plating, uses chromium sulfate or chromium chloride as the main ingredient. Trivalent chromium plating is an alternative to hexavalent chromium in certain applications and thicknesses (e.g. decorative plating). [2]

  5. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    [1] Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures.

  6. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. [1] [2]

  7. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm/min at relatively low substrate temperatures, with very high material utilization efficiency. The ...

  8. Pulsed laser deposition - Wikipedia

    en.wikipedia.org/wiki/Pulsed_laser_deposition

    A plume ejected from a SrRuO 3 target during pulsed laser deposition. One possible configuration of a PLD deposition chamber. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.

  9. Custom wheel - Wikipedia

    en.wikipedia.org/wiki/Custom_wheel

    Custom wheels come in many different finishes. The most common custom wheel finishes are Chrome, Polished and Painted. Chrome wheels consist of traditional chrome plating as well as the new process of PVD (Physical Vapor Deposition) Chrome. PVD chrome wheels are protected with a clear coat and are now being introduced by several wheel companies.

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