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Contrast is the difference from exposed portion to unexposed portion. The higher the contrast is, the more obvious the difference between exposed and unexposed portions would be. Sensitivity Sensitivity is the minimum energy that is required to generate a well-defined feature in the photoresist on the substrate, measured in mJ/cm 2. The ...
In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry.
The difference between steppers and scanners is that, during exposure, a scanner moves the photomask and the wafer simultaneously, while a stepper only moves the wafer. Contact, proximity and projection Mask aligners preceded steppers [39] [40] and do not move the photomask nor the wafer during exposure and use masks that cover the entire wafer.
A variety of reticles, each appropriate for one stage in the process, are contained in a rack in the reticle loader, usually located at the upper front of the stepper. Before the wafer is exposed a reticle is loaded onto the reticle stage by a robot, where it is also very precisely aligned. Since the same reticle can be used to expose many ...
Conformal coating spray booth. Spray coating can be completed with a spray aerosol or spray gun and is suitable for low- and medium-volume processing. The coating application may be limited due to 3D effects. The masking requirements have less penetration. This method can be used in spray booths for medium-scale production. [5]
Cleansing oil, or oil cleanser, is an oil-based solution that gently emulsifies the skin's natural oils and removes makeup. Cleansing oils are typically used as part of a two-step cleansing process. After the skin has been cleansed with an oil cleanser, a second cleanse is done using a mild gel, milk or cream cleanser to ensure any traces of ...
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An illustration of OPC (Optical Proximity Correction). The blue Γ-like shape is what chip designers would like printed on a wafer, in green is the pattern on a mask after applying optical proximity correction, and the red contour is how the shape actually prints on the wafer (quite close to the desired blue target).
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