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  2. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    A FIB workstation. Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).

  3. Teodor Gotszalk - Wikipedia

    en.wikipedia.org/wiki/Teodor_Gotszalk

    The studies combine scanning probe microscopy, scanning electron microscopy and focused ion beam (SPM, SEM and FIB) techniques together with measurements of electrical, thermal, diffractive and optical properties of the structures. [4] Teodor Gotszalk has been a Corresponding member of the Polish Academy of Sciences since 2022. [5]

  4. Ion beam analysis - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_analysis

    The configuration of the ion beam apparatus can be changed and made more complex with the incorporation of additional components. The techniques for ion beam analysis are designed for specific purposes. Some techniques and ion sources are shown in table 1. Detector types and arrangements for ion beam techniques are shown in table 2.

  5. TESCAN - Wikipedia

    en.wikipedia.org/wiki/TESCAN

    In 2013, TESCAN ORSAY HOLDING was established following the merger of the Czech company TESCAN, a leading global developer and supplier of scanning electron microscopes (SEMs) and focused ion beam (FIB) workstations, and the French company ORSAY PHYSICS, a world leader in customized Focused Ion Beam and Electron Beam technology. [5]

  6. Ion beam - Wikipedia

    en.wikipedia.org/wiki/Ion_beam

    Carl Zeiss Crossbeam 550 – combines a field emission scanning electron microscope (FE-SEM) with a focused ion beam (FIB). Nanofluidics channels fabricated with a Zeiss Crossbeam 550 L, in a silicon master stamp. Ion beams can be used for material modification (e.g. by sputtering or ion beam etching) and for ion beam analysis.

  7. Electron beam-induced deposition - Wikipedia

    en.wikipedia.org/wiki/Electron_beam-induced...

    Deposition occurs in a focused ion beam (FIB) setup, which strongly limits characterization of the deposit during or right after the deposition. Only SEM-like imaging using secondary electrons is possible, and even that imaging is restricted to short observations due to sample damaging by the Ga + beam. The use of a dual beam instrument, that ...

  8. Microprobe - Wikipedia

    en.wikipedia.org/wiki/Microprobe

    When the ion energy is in the range of a few tens of keV (kilo-electronvolt) these microprobes are usually called FIB (Focused ion beam). An FIB makes a small portion of the material into a plasma; the analysis is done by the same basic techniques as the ones used in mass spectrometry. When the ion energy is higher, hundreds of keV to a few MeV ...

  9. Raman microscope - Wikipedia

    en.wikipedia.org/wiki/Raman_microscope

    The sample is placed in the vacuum chamber of the electron microscope. Both analysis methods are then performed automatically at the same sample location. The obtained SEM and Raman images can then be superimposed. [20] [21] Moreover, adding a focused ion beam (FIB) on the chamber allows removal of the material and therefore 3D imaging of the ...