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  2. Spin coating - Wikipedia

    en.wikipedia.org/wiki/Spin_coating

    Laurell Technologies WS-400 spin coater used to apply photoresist to the surface of a silicon wafer. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material in liquid form is applied on the center of the substrate, which is either spinning at low speed or not spinning at all.

  3. Nanocrystal solar cell - Wikipedia

    en.wikipedia.org/wiki/Nanocrystal_solar_cell

    A thin film of nanocrystals is obtained by a process known as "spin-coating". This involves placing an amount of the quantum dot solution onto a flat substrate, which is then rotated very quickly. The solution spreads out uniformly, and the substrate is spun until the required thickness is achieved.

  4. SU-8 photoresist - Wikipedia

    en.wikipedia.org/wiki/SU-8_photoresist

    SU-8 molecule. SU-8 is a commonly used epoxy-based negative photoresist.Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development.

  5. Chemistry of photolithography - Wikipedia

    en.wikipedia.org/wiki/Chemistry_of_photolithography

    There are four basic parameters that are involved in spin coating: solution viscosity, solid content (density), angular speed, and spin time. [13] A range of thicknesses can be achieved by spin coating. Most commonly the thicknesses range from 1-200 μm. The main properties that affect the thickness of the film are viscosity and spin speed.

  6. Layer by layer - Wikipedia

    en.wikipedia.org/wiki/Layer_by_layer

    The bilayers and wash steps can be performed in many different ways including dip coating, spin-coating, spray-coating, flow based techniques and electro-magnetic techniques. [1] The preparation method distinctly impacts the properties of the resultant films, allowing various applications to be realized. [ 1 ]

  7. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    Dip coating is similar to spin coating in that a liquid precursor or sol-gel precursor is deposited on a substrate, but in this case the substrate is completely submerged in the solution and then withdrawn under controlled conditions. By controlling the withdrawal speed, the evaporation conditions (principally the humidity, temperature) and the ...

  8. Nanosphere lithography - Wikipedia

    en.wikipedia.org/wiki/Nanosphere_lithography

    Spin Coating and solvent evaporation methods are capable of producing large areas of particles, but with limited control over the layer homogeneity or thickness. [ 3 ] Solvent evaporation is accomplished via drop coating, and is arguably the simplest method to produce a monolayer of nanospheres, as the spheres are simply dropped onto the ...

  9. Sol–gel process - Wikipedia

    en.wikipedia.org/wiki/Sol–gel_process

    The precursor sol can be either deposited on a substrate to form a film (e.g., by dip-coating or spin coating), cast into a suitable container with the desired shape (e.g., to obtain monolithic ceramics, glasses, fibers, membranes, aerogels), or used to synthesize powders (e.g., microspheres, nanospheres). [1]