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Laurell Technologies WS-400 spin coater used to apply photoresist to the surface of a silicon wafer. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material in liquid form is applied on the center of the substrate, which is either spinning at low speed or not spinning at all.
There are four basic parameters that are involved in spin coating: solution viscosity, solid content (density), angular speed, and spin time. [13] A range of thicknesses can be achieved by spin coating. Most commonly the thicknesses range from 1-200 μm. The main properties that affect the thickness of the film are viscosity and spin speed.
SU-8 molecule. SU-8 is a commonly used epoxy-based negative photoresist.Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development.
Slot-die coating is a non-contact coating method, in which the slot-die is typically held over the substrate at a height several times higher than the target wet film thickness. [23] The coating fluid transfers from the slot-die to the substrate via a fluid bridge that spans the air gap between the slot-die lips and substrate surface.
Dip coating is similar to spin coating in that a liquid precursor or sol-gel precursor is deposited on a substrate, but in this case the substrate is completely submerged in the solution and then withdrawn under controlled conditions. By controlling the withdrawal speed, the evaporation conditions (principally the humidity, temperature) and the ...
Spin glass when contrasted with a ferromagnet is defined as "disordered" magnetic state in which spins are aligned randomly or without a regular pattern and the couplings too are random. [1] A spin glass should not be confused with a "spin-on glass". The latter is a thin film, usually based on SiO 2, which is applied via spin coating.
The first self-cleaning glass was based on a thin film titania coating. [3] The film can be applied by spin coating of organo-titanate chelated precursor (for example titanium iso-tetrapropoxide chelated by acetylacetone), followed by heat treatment at elevated temperatures to burn the organic residues and to form the anatase phase.
Schematic representation of the different stages and routes of the sol–gel technology. In this chemical procedure, a "sol" (a colloidal solution) is formed that then gradually evolves towards the formation of a gel-like diphasic system containing both a liquid phase and solid phase whose morphologies range from discrete particles to continuous polymer networks.