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Ion milling is a specialized physical etching technique that is a crucial step in the preparation of material analysis techniques. After a specimen goes through ion milling, the surface becomes much smoother and more defined, which allows scientists to study the material much easier.
Molecular beam epitaxy system Veeco Gen II at the FZU – Institute of Physics of the Czech Academy of Sciences. The system is designed for growth of monocrystalline semiconductors, semiconducting heterostructures, materials for spintronics and other compound material systems containing Al, Ga, As, P, Mn, Cu, Si and C.
Veeco Instruments Inc. is a global capital equipment supplier, headquartered in the U.S., that designs and builds processing systems used in semiconductor and compound semiconductor manufacturing, data storage and scientific markets for applications such as advanced packaging, photonics, power electronics and display technologies.
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Most widespread instruments are using liquid metal ion sources (LMIS), especially gallium ion sources. Ion sources based on elemental gold and iridium are also available. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle, and heated gallium wets the tungsten and flows to the tip of the needle, where the opposing forces of surface tension and electric field form the ...
Ion milling, or sputter etching, uses lower pressures, often as low as 10 −4 Torr (10 mPa). It bombards the wafer with energetic ions of noble gases, often Ar +, which knock atoms from the substrate by transferring momentum. Because the etching is performed by ions, which approach the wafer approximately from one direction, this process is ...
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