Ad
related to: furnace annealing
Search results
Results from the WOW.Com Content Network
Furnace anneals are performed by equipment especially built to heat semiconductor wafers. Furnaces are capable of processing many wafers at a time, but each process can last between several hours and a day. Increasingly, furnace anneals are being supplanted by Rapid Thermal Anneal (RTA) or Rapid Thermal Processing (RTP). This is due to the ...
For high volume process annealing, gas fired conveyor furnaces are often used. For large workpieces or high quantity parts, car-bottom furnaces are used so workers can easily move the parts in and out. Once the annealing process is successfully completed, workpieces are sometimes left in the oven so the parts cool in a controllable way.
Heat treating furnace at 1,800 °F (980 °C) Heat treating (or heat treatment) is a group of industrial, thermal and metalworking processes used to alter the physical, and sometimes chemical, properties of a material.
Vacuum furnaces capable of temperatures above 1200 °C are used in various industry sectors such as electronics, medical, crystal growth, energy and artificial gems. The processing of high temperature materials, both of metals and nonmetals, in a vacuum environment allows annealing , brazing , purification , sintering and other processes to ...
Forming Gas Annealing (FGA) uses H 2 at 400–500 °C. A new approach is the use of High Temperature Steam Annealing (HSA), which uses water vapor at 250–400 °C. In HSA, water vapor applied in a furnace can improve the density of oxides without the use of hydrogen.
Unlike furnace anneals they are of short duration, processing each wafer in several minutes. To achieve short annealing times and quick throughput, sacrifices are made in temperature and process uniformity, temperature measurement and control, and wafer stress.
The highest recorded temperature in the U.S. was also recorded in California's aptly named Furnace Creek in 1913. It was 134 degrees on July 10. peterleabo/istockphoto.
It also finds application in microchip production, where a high-temperature anneal in forming gas assists in silicon-silicon dioxide interface passivation. Quite often forming gas is used in furnaces during annealing or sintering for the thermal treatment of metals, because it reduces oxides on the metal surface. [4]
Ad
related to: furnace annealing