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  2. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation. PVD is used in the manufacturing of items which require thin films for optical, mechanical, electrical, acoustic or chemical ...

  3. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    Thin-film deposition is a process applied in the semiconductor industry to grow electronic materials, in the aerospace industry to form thermal and chemical barrier coatings to protect surfaces against corrosive environments, in optics to impart the desired reflective and transmissive properties to a substrate and elsewhere in industry to modify surfaces to have a variety of desired properties.

  4. semiconductor – a material with an electrical conductivity value falling between that of a conductor and an insulator; its resistivity falls as its temperature rises; silicon – the semiconductor material used most frequently as a substrate in electronics; silicon on insulator (SoI) – a layered silicon–insulator–silicon substrate

  5. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. [1] [2]

  6. Chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_deposition

    DC plasma (violet) enhances the growth of carbon nanotubes in a laboratory-scale PECVD (plasma-enhanced chemical vapor deposition) apparatus. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials.

  7. Plasma-enhanced chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Plasma-enhanced_chemical...

    PECVD machine at LAAS technological facility in Toulouse, France.. Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state to a solid state on a substrate.

  8. Glossary of electrical and electronics engineering - Wikipedia

    en.wikipedia.org/wiki/Glossary_of_electrical_and...

    A semiconductor device that produces coherent laser radiation when properly energized. leakage inductance The inductance of a transformer that results from magnetic flux not linked by both primary and secondary windings. light-emitting diode A semiconductor device that produces light or infrared or ultraviolet radiation when properly energized.

  9. Polyvinylidene fluoride - Wikipedia

    en.wikipedia.org/wiki/Polyvinylidene_fluoride

    It can be injected, molded or welded and is commonly used in the chemical, semiconductor, medical and defense industries, as well as in lithium-ion batteries. It is also available as a cross-linked closed-cell foam , used increasingly in aviation and aerospace applications, and as an exotic 3D printer filament.