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  2. Stepper - Wikipedia

    en.wikipedia.org/wiki/Stepper

    In this system, a single parent mask, known as the reticle, was produced at large scale so it could be mechanically robust. This was imaged through a photographic projector, shrinking the projected image 5 to 10 times. The mechanism imaged the reticle onto a photographic plate, moved the reticle to another position, and repeated this process.

  3. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    In semiconductor manufacturing, a mask is sometimes called a reticle. [1] [2] In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns ...

  4. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    The difference between steppers and scanners is that, during exposure, a scanner moves the photomask and the wafer simultaneously, while a stepper only moves the wafer. Contact, proximity and projection Mask aligners preceded steppers [39] [40] and do not move the photomask nor the wafer during exposure and use masks that cover the entire wafer.

  5. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    Contrast is the difference from exposed portion to unexposed portion. The higher the contrast is, the more obvious the difference between exposed and unexposed portions would be. Sensitivity Sensitivity is the minimum energy that is required to generate a well-defined feature in the photoresist on the substrate, measured in mJ/cm 2. The ...

  6. Hardmask - Wikipedia

    en.wikipedia.org/wiki/Hardmask

    Hardmask materials can be metal or dielectric. Silicon based masks such as silicon dioxide or silicon carbide are usually used for etching low-κ dielectrics. [3] However, SiOCH (carbon doped hydrogenated silicon oxide), a material used to insulate copper interconnects, [4] requires an etchant that attacks silicon compounds.

  7. We Ask a Derm: What's the Difference Between An Eye ... - AOL

    www.aol.com/lifestyle/ask-derm-whats-difference...

    PureWow editors select every item that appears on this page, and the company may earn compensation through affiliate links within the story. You can learn more about that process here. Yahoo Inc ...

  8. Phase-shift mask - Wikipedia

    en.wikipedia.org/wiki/Phase-shift_mask

    A benefit of using phase-shift masks in lithography is the reduced sensitivity to variations of feature sizes on the mask itself. This is most commonly used in alternating phase-shift masks, where the linewidth becomes less and less sensitive to the chrome width on the mask, as the chrome width decreases.

  9. The dangers of LED face masks you should know about - AOL

    www.aol.com/lifestyle/dangers-led-face-masks...

    "The potential dangers of using at-home LED masks include headaches, eye strain, sleep disturbances, insomnia and mild visual side effects," she explained. "It’s essential to go to a board ...