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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
English: This PDF displays the movements of the internal Conus docking cones within the Mir core module's forward docking hub over the lifetime of the station. Most Conus movements were made by cosmonauts during internal EVAs lasting approximately 20 minutes, as the Conus placement required removing one of four outer hatches exposing the pressurised hub to the vacuum of space.
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The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. As suggested by the name compounded from them, photolithography is a printing method (originally based on the use of limestone printing plates) in which light plays an essential role.
Placement is an essential step in electronic design automation — the portion of the physical design flow that assigns exact locations for various circuit components within the chip's core area. An inferior placement assignment will not only affect the chip 's performance but might also make it non-manufacturable by producing excessive wire ...
The diagram shows that there are three quartet excited states: 4 T 2, 4 A 2, and 4 T 1 (P). From the diagram one can predict that there are three spin-allowed transitions. However, the spectrum of [Co(H 2 O) 6] 2+ does not show three distinct peaks that correspond to the three predicted excited states. Instead, the spectrum has a broad peak ...
There has also been a growing interest in ultraviolet communication (UVC) as a result of recent progress in solid-state optical sources/detectors operating within solar-blind UV spectrum (200–280 nm). In this so-called deep UV band, solar radiation is negligible at the ground level and this makes possible the design of photon-counting ...
Low-pressure mercury-vapor lamps generate primarily 254 nm 'UVC' energy, and are most commonly used in disinfection applications. Operated at lower temperatures and with less voltage than medium-pressure lamps, they, like all UV sources , require shielding when operated to prevent excess exposure of skin and eyes.