enow.com Web Search

Search results

  1. Results from the WOW.Com Content Network
  2. Spin coating - Wikipedia

    en.wikipedia.org/wiki/Spin_coating

    Laurell Technologies WS-400 spin coater used to apply photoresist to the surface of a silicon wafer. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material in liquid form is applied on the center of the substrate, which is either spinning at low speed or not spinning at all.

  3. Chemistry of photolithography - Wikipedia

    en.wikipedia.org/wiki/Chemistry_of_photolithography

    There are four basic parameters that are involved in spin coating: solution viscosity, solid content (density), angular speed, and spin time. [13] A range of thicknesses can be achieved by spin coating. Most commonly the thicknesses range from 1-200 μm. The main properties that affect the thickness of the film are viscosity and spin speed.

  4. Spin casting - Wikipedia

    en.wikipedia.org/wiki/Spin_casting

    Spin casting is a favored method for fabricating items in the specified materials – low temperature metals and thermoset plastics. Compared to the two main competing processes, injection molding and (zinc) die-casting, spin casting has significant advantages in terms of startup cost and ease of use.

  5. Layer by layer - Wikipedia

    en.wikipedia.org/wiki/Layer_by_layer

    The bilayers and wash steps can be performed in many different ways including dip coating, spin-coating, spray-coating, flow based techniques and electro-magnetic techniques. [1] The preparation method distinctly impacts the properties of the resultant films, allowing various applications to be realized. [ 1 ]

  6. Sol–gel process - Wikipedia

    en.wikipedia.org/wiki/Sol–gel_process

    The precursor sol can be either deposited on a substrate to form a film (e.g., by dip-coating or spin coating), cast into a suitable container with the desired shape (e.g., to obtain monolithic ceramics, glasses, fibers, membranes, aerogels), or used to synthesize powders (e.g., microspheres, nanospheres). [1]

  7. Nanoparticle deposition - Wikipedia

    en.wikipedia.org/wiki/Nanoparticle_deposition

    Creating high density monolayers is typically very difficult since the methods are lacking the packing density control. Also, the volume of nanoparticle suspension required for both spin coating and dip coating is rather big which may be an issue when using expensive nanoparticle materials.

  8. Nanosphere lithography - Wikipedia

    en.wikipedia.org/wiki/Nanosphere_lithography

    Spin Coating and solvent evaporation methods are capable of producing large areas of particles, but with limited control over the layer homogeneity or thickness. [ 3 ] Solvent evaporation is accomplished via drop coating, and is arguably the simplest method to produce a monolayer of nanospheres, as the spheres are simply dropped onto the ...

  9. Category:Thin film deposition - Wikipedia

    en.wikipedia.org/wiki/Category:Thin_film_deposition

    This page was last edited on 10 November 2020, at 11:55 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike 4.0 License; additional terms may apply.