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Piranha solution
RCA clean - Wikipedia ... RCA clean
Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...
This page was last edited on 6 August 2007, at 19:43 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike License 4.0; additional terms may ...
Plasma cleaning. Fig. 1. The surface of a MEMS device is cleaned with bright, blue oxygen plasma in a plasma etcher to rid it of carbon contaminants. (100mTorr, 50W RF) Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from ...
Wet etching was widely used in the 1960s and 1970s, [133] [134] but it was replaced by dry etching/plasma etching starting at the 10 micron to 3 micron nodes. [135] [136] This is because wet etching makes undercuts (etching under mask layers or resist layers with patterns). [137] [138] [139] Dry etching has become the dominant etching technique ...
Peroxymonosulfuric acid
In a video interview with the Academy, Rowlands describes a liberating lesson her husband gave her on “A Woman Under the Influence.”. Rowlands was second-guessing her ability to play the title ...
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