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Piranha solution
Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...
RCA clean - Wikipedia ... RCA clean
Semiconductor device fabrication
This page was last edited on 6 August 2007, at 19:43 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike License 4.0; additional terms may ...
Buffered oxide etch
Plasma cleaning. Fig. 1. The surface of a MEMS device is cleaned with bright, blue oxygen plasma in a plasma etcher to rid it of carbon contaminants. (100mTorr, 50W RF) Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from ...
Chemistry of photolithography. A gold and aluminum sputtered solar cell manufactured from a <100> p-type silicon wafer at the Cal Poly San Luis Obispo Microfab clean room. Photolithography is a process in removing select portions of thin films used in microfabrication. Microfabrication is the production of parts on the micro- and nano- scale ...
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