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Piranha solution
Etching (microfabrication) Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in ...
RCA clean - Wikipedia ... RCA clean
Plasma cleaning. Fig. 1. The surface of a MEMS device is cleaned with bright, blue oxygen plasma in a plasma etcher to rid it of carbon contaminants. (100mTorr, 50W RF) Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from ...
Semiconductor device fabrication
Piranha solution can be used to increase the surface density of reactive hydroxyl groups on the surface of silicon. The –OH groups can hydrolyze and subsequently form siloxane linkages (Si-O-Si) with organic silane molecules. Preparation of silicon surfaces for silanization involves the removal of surface contaminants.
This page was last edited on 6 August 2007, at 19:43 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike License 4.0; additional terms may ...
Buffered oxide etch
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