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Bill Parker (inventor) William P. Parker is an American artist, scientist, and entrepreneur, best known for inventing the modern design of the plasma globe. [1] The invention occurred in 1971, when Parker was working as a student in a physics laboratory at the Massachusetts Institute of Technology and accidentally filled a test chamber to a ...
Plasma cutting is a process that cuts through electrically conductive materials by means of an accelerated jet of hot plasma. Typical materials cut with a plasma torch include steel, stainless steel, aluminum, brass and copper, although other conductive metals may be cut as well. Plasma cutting is often used in fabrication shops, automotive ...
Fig. 2. The construction of Inductively Coupled Plasma torch. [3] A: cooling gas tangential flow to the outer quartz tube B: discharge gas flow (usually Ar) C: flow of carrier gas with sample D: induction coil which forms the strong magnetic field inside the torch E: force vectors of the magnetic field F: the plasma torch (the discharge).
Plasma torch. A plasma torch cutter. A plasma torch (also known as a plasma arc, plasma gun, plasma cutter, or plasmatron) is a device for generating a directed flow of plasma. [1][2][3] The plasma jet can be used for applications including plasma cutting, plasma arc welding, plasma spraying, and plasma gasification for waste disposal. [4]
A current-driven toroidal Z-pinch in a krypton plasma. A pinch (or: Bennett pinch[2] (after Willard Harrison Bennett), electromagnetic pinch, [3] magnetic pinch, [4] pinch effect, [5] or plasma pinch. [6]) is the compression of an electrically conducting filament by magnetic forces, or a device that does such. The conductor is usually a plasma ...
A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine -bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process ...
Note the inverted-'Y' shape of the plasma column. Direct-current plasma (DCP) is a type of plasma source used for atomic emission spectroscopy that utilizes three electrodes to produce a plasma stream. [1] The most common three-electrode DCP apparatus consists of two graphite anode blocks and a tungsten cathode block arranged in an inverted-Y ...
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