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In semiconductor manufacturing, a mask is sometimes called a reticle. [1] [2] In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns ...
A variety of reticles, each appropriate for one stage in the process, are contained in a rack in the reticle loader, usually located at the upper front of the stepper. Before the wafer is exposed a reticle is loaded onto the reticle stage by a robot, where it is also very precisely aligned. Since the same reticle can be used to expose many ...
reticle – a partial plate with holes or transparencies used in photolithography integrated circuit fabrication RDL – see redistribution layer semiconductor – a material with an electrical conductivity value falling between that of a conductor and an insulator ; its resistivity falls as its temperature rises
Both wafers and reticles can be handled by SMIF pods in a semiconductor fabrication environment. Used in lithographic tools, reticles or photomasks contain the image that is exposed on a coated wafer in one processing step of a complete integrated semiconductor manufacturing cycle. Because reticles are linked so directly with wafer processing ...
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as microprocessors, microcontrollers, and memories (such as RAM and flash memory).
Photolithography is the most common method for the semiconductor fabrication of integrated circuits ("ICs" or "chips"), such as solid-state memories and microprocessors. It can create extremely small patterns, down to a few nanometers in size. It provides precise control of the shape and size of the objects it creates.
This process starts with the design of the IC circuitry as a series of layers than will be patterned onto the surface of a sheet of silicon or other semiconductor material known as a wafer. Each layer of the ultimate design is patterned onto a photomask , which in modern systems is made of fine lines of chromium deposited on highly purified ...
Computational lithography came to the forefront of photolithography technologies in 2008 when the semiconductor industry faced challenges associated with the transition to a 22 nanometer CMOS microfabrication process and has become instrumental in further shrinking the design nodes and topology of semiconductor transistor manufacturing.