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In synthetic diamond grown by the high-pressure high-temperature synthesis [5] or chemical vapor deposition, [6] [7] defects with symmetry lower than tetrahedral align to the direction of the growth. Such alignment has also been observed in gallium arsenide [ 8 ] and thus is not unique to diamond.
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films .
Chemical vapor deposition (CVD) is used to synthesize Si-V centers via a similar process to that used to produce N-V centers [20].. In the case of Si-V centers, there are two main types of CVD used. First, when a solid containing Silicon is etched with hydrogen, and SiH x radicals dope the diamond lattice. [21]
Carbon films are produced by deposition using gas-phase deposition processes, in most cases taking place in a vacuum: chemical vapor deposition, CVD or physical vapor deposition, PVD. They are deposited in the form of thin films with film thicknesses of just a few micrometres .
A chemical leak from a rail car has shut down the 215 Freeway in both directions in Riverside County and prompted the evacuation of more than 100 homes.
Evaporation is a common method of thin-film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel directly to the target object (substrate), where they condense back to a solid state. Evaporation is used in microfabrication, and to make macro-scale products such as metallized plastic film.
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