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A FIB workstation. Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).
Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas.
The configuration of the ion beam apparatus can be changed and made more complex with the incorporation of additional components. The techniques for ion beam analysis are designed for specific purposes. Some techniques and ion sources are shown in table 1. Detector types and arrangements for ion beam techniques are shown in table 2.
Deposition occurs in a focused ion beam (FIB) setup, which strongly limits characterization of the deposit during or right after the deposition. Only SEM-like imaging using secondary electrons is possible, and even that imaging is restricted to short observations due to sample damaging by the Ga + beam. The use of a dual beam instrument, that ...
The term itself was coined by Golovchenko and co-workers at Harvard in the paper "Ion-beam sculpting at nanometer length scales." [ 1 ] In the process, solid-state nanopores are formed by lateral mass transport about the surface of the substrate, not simply by sputtering , which is the removal of material from the surface.
A small ion beam rocket being tested by NASA. An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely ...
As the helium ion beam interacts with the sample, it does not suffer from a large excitation volume, and hence provides sharp images with a large depth of field on a wide range of materials. Compared to a SEM, the secondary electron yield is quite high, allowing for imaging with currents as low as 1 femtoamp. The detectors provide information ...
A liquid metal ion source (LMIS) is an ion source which uses metal that is heated to the liquid state and used to form an electrospray to form ions. [1] [2] An electrospray Taylor cone is formed by the application of a strong electric field and ions are produced by field evaporation at the sharp tip of the cone, which has a high electric field.