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N-Methyl-2-pyrrolidone (NMP) is an organic compound consisting of a 5-membered lactam. It is a colorless liquid, although impure samples can appear yellow. It is miscible with water and with most common organic solvents. It also belongs to the class of dipolar aprotic solvents such as dimethylformamide and dimethyl sulfoxide.
N-Methylmorpholine is the organic compound with the formula O(CH 2 CH 2) 2 NCH 3.It is a colorless liquid. It is a cyclic tertiary amine.It is used as a base catalyst for generation of polyurethanes and other reactions.
It is miscible with water and many organic solvents. [11] Dihydrolevoglucosenone has a boiling point of 226 °C at 101.325 kPa (vs 202 °C for NMP), and a vapor pressure of 12.98 Pa near room temperature (25 °C). [1] It has a comparatively high dynamic viscosity of 14.5 cP (for comparison DMF: 0.92 cP at 20 °C, NMP: 1.67 cP at 25 °C). [12]
Trituration removes highly soluble impurities from usually solid insoluble material by rinsing it with an appropriate solvent. Adsorption removes a soluble impurity from a feed stream by trapping it on the surface of a solid material, such as activated carbon, that forms strong non-covalent chemical bonds with the impurity.
Chemists remove gases from solvents when the compounds they are working on are possibly air- or oxygen-sensitive (air-free technique), or when bubble formation at solid-liquid interfaces becomes a problem. The formation of gas bubbles when a liquid is frozen can also be undesirable, necessitating degassing beforehand.
Acid–base extraction is a subclass of liquid–liquid extractions and involves the separation of chemical species from other acidic or basic compounds. [1] It is typically performed during the work-up step following a chemical synthesis to purify crude compounds [2] and results in the product being largely free of acidic or basic impurities.
NMP liquid exfoliation method was shown to yield phosphorene with controllable size and layer number, excellent water stability and in high yield. [9] The disadvantage of the current methods includes long sonication time, high boiling point solvents, and low efficiency. Therefore, other physical methods for liquid exfoliation are still under ...
When the sacrificial layer is washed away (photoresist in a solvent), the material on the top is lifted-off and washed together with the sacrificial layer below. After the lift-off, the target material remains only in the regions where it had a direct contact with the substrate.