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  2. Tumble finishing - Wikipedia

    en.wikipedia.org/wiki/Tumble_finishing

    Typically, a full tumble polish from rough rock to polish takes 3–5 weeks, and is done in a minimum of 3 steps. Initially, the rocks are smoothed with a coarse grit (such as 60-90 mesh ). The idea behind the first step is to take rough rock or stone and grind it (tumble it) down into a form which is indistinguishable (in shape) from the final ...

  3. Travertine - Wikipedia

    en.wikipedia.org/wiki/Travertine

    Travertine terraces at Mammoth Hot Springs, Yellowstone National Park, in 2016 Calcium-carbonate-encrusted, growing moss in a low-temperature freshwater travertine formation (1 euro coin for scale) Travertine ( / ˈ t r æ v ər t iː n / TRAV -ər-teen ) [ 1 ] is a form of terrestrial limestone deposited around mineral springs , especially hot ...

  4. Everything You Need to Know About Travertine—Plus How ... - AOL

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  5. Surface finish - Wikipedia

    en.wikipedia.org/wiki/Surface_finish

    In machining, the interaction of the cutting edges and the microstructure of the material being cut both contribute to the final surface finish. [citation needed] In general, the cost of manufacturing a surface increases as the surface finish improves. [4]

  6. Flowstone - Wikipedia

    en.wikipedia.org/wiki/Flowstone

    Travertine is a calcium carbonate deposit often formed in creeks or rivers; its nature is laminated, and it includes such structures as stalagmites and stalactites. The deposits may grade into thin sheets called " draperies " or "curtains" where they descend from overhanging portions of the wall.

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  8. Tufa - Wikipedia

    en.wikipedia.org/wiki/Tufa

    Tufa columns at Mono Lake, California. Tufa is a variety of limestone formed when carbonate minerals precipitate out of water in unheated rivers or lakes. Geothermally heated hot springs sometimes produce similar (but less porous) carbonate deposits, which are known as travertine or thermogene travertine.

  9. Chemical-mechanical polishing - Wikipedia

    en.wikipedia.org/wiki/Chemical-mechanical_polishing

    In order to compensate for the wafer bow, pressure can be applied to the wafer's backside which, in turn, will equalize the centre-edge differences. The pads used in the CMP tool should be rigid in order to uniformly polish the wafer surface. However, these rigid pads must be kept in alignment with the wafer at all times.

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