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  2. High-power impulse magnetron sputtering - Wikipedia

    en.wikipedia.org/wiki/High-power_impulse...

    The deposition of copper films by HIPIMS was reported for the first time by V. Kouznetsov for the application of filling 1 μm vias with aspect ratio of 1:1.2 [10] Transition metal nitride (CrN) thin films were deposited by HIPIMS for the first time in February 2001 by A.P. Ehiasarian. [11]

  3. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  4. Low-energy plasma-enhanced chemical vapor deposition

    en.wikipedia.org/wiki/Electromagnetically...

    Plasma (argon-only on the left, argon and silane on the right) inside a prototype LEPECVD reactor at the LNESS laboratory in Como, Italy.. Low-energy plasma-enhanced chemical vapor deposition (LEPECVD) is a plasma-enhanced chemical vapor deposition technique used for the epitaxial deposition of thin semiconductor (silicon, germanium and SiGe alloys) films.

  5. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...

  6. Surface finishing - Wikipedia

    en.wikipedia.org/wiki/Surface_finishing

    Surface finishing is often one of the final steps taken when working metal and is essential for guaranteeing that metal components meet the requirements of the necessary finish. Surface finishing processes can be categorized by how they affect the workpiece: Removing or reshaping finishing; Adding or altering finishing; Coating Methods

  7. Chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_deposition

    PECVD processing allows deposition at lower temperatures, which is often critical in the manufacture of semiconductors. The lower temperatures also allow for the deposition of organic coatings, such as plasma polymers, that have been used for nanoparticle surface functionalization. [6]

  8. Category:Coatings - Wikipedia

    en.wikipedia.org/wiki/Category:Coatings

    Glass coating and surface modification (23 P) M. ... Thin film deposition (4 C, 58 P) V. Varnishes (6 P) ... Combustion chemical vapor deposition; Conformal coating ...

  9. Biomaterial surface modifications - Wikipedia

    en.wikipedia.org/wiki/Biomaterial_Surface...

    In general, the lower the surface tension of a liquid coating, the easier it will be to form a satisfactory wet film from it. The difference between the surface tension of a coating and the surface energy of a solid substrate to which a coating is applied affects how the liquid coating flows out over the substrate.

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