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Tantalum is a chemical element; it has symbol Ta and atomic number 73. It is named after Tantalus, a figure in Greek mythology. [11] Tantalum is a very hard, ductile, lustrous, blue-gray transition metal that is highly corrosion-resistant. It is part of the refractory metals group, which are widely used as components of strong high-melting ...
Coltan is used primarily for the production of tantalum capacitors, used in mobile phones and almost every kind of electronic device. [ 31 ] [ 32 ] [ 33 ] Niobium and tantalum have a wide range of uses, including refractive lenses for glasses, cameras, phones and printers.
Tantalum ores often contain significant amounts of niobium, which is itself a valuable metal.As such, both metals are extracted so that they may be sold. The overall process is one of hydrometallurgy and begins with a leaching step; in which the ore is treated with hydrofluoric acid and sulfuric acid to produce water-soluble hydrogen fluorides, such as the heptafluorotantalate.
The mineral group tantalite [(Fe, Mn)Ta 2 O 6] is the primary source of the chemical element tantalum, a corrosion (heat and acid) resistant metal.It is chemically similar to columbite, and the two are often grouped together as a semi-singular mineral called coltan or "columbite-tantalite" in many mineral guides.
Pages in category "Tantalum compounds" The following 16 pages are in this category, out of 16 total. This list may not reflect recent changes. O. Organotantalum ...
This page was last edited on 23 October 2017, at 19:05 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike 4.0 License; additional terms may apply.
It takes the form of a white powder and is commonly used as a starting material in tantalum chemistry. It readily hydrolyzes to form tantalum(V) oxychloride (TaOCl 3) and eventually tantalum pentoxide (Ta 2 O 5); this requires that it be synthesised and manipulated under anhydrous conditions, using air-free techniques.
Single crystals of TaB, Ta 5 B 6, Ta 3 B 4 or TaB 2 (about 1 cm diameter, 6 cm length) can be produced by the floating zone method. [2] [3]Tantalum boride films can be deposited from a gas mixture of TaCl 5-BCl 3-H 2-Ar in the temperature range 540–800 °C.
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