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  2. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. "Thin" is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres .

  3. High-power impulse magnetron sputtering - Wikipedia

    en.wikipedia.org/wiki/High-power_impulse...

    HIPIMS has been successfully applied for the deposition of thin films in industry, particularly on cutting tools. The first HIPIMS coating units appeared on the market in 2006. The gold version of the Apple iPhone 12 Pro uses this process on the structural stainless steel band that also serves as the device's antenna system. [22]

  4. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  5. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    Thin-film deposition is a process applied in the semiconductor industry to grow electronic materials, in the aerospace industry to form thermal and chemical barrier coatings to protect surfaces against corrosive environments, in optics to impart the desired reflective and transmissive properties to a substrate and elsewhere in industry to modify surfaces to have a variety of desired properties.

  6. Electrophoretic deposition - Wikipedia

    en.wikipedia.org/wiki/Electrophoretic_deposition

    It can be determined by plotting the film build of a given system versus coating temperature keeping the coating time and voltage application profile constant. At temperatures below the coalescence temperature, film growth behavior and rupturing behavior is quite different from the usual practice as a result of porous deposition.

  7. Electromagnetically enhanced Physical Vapor Deposition

    en.wikipedia.org/wiki/Electromagnetically...

    EPVD technology was developed by Paradigm Shift Technologies, Inc., a Canadian company founded in 1995. It was invented to replace the traditional chrome plating. [1]Thin-film deposition is the overarching technology from which PVD, CVD, ALD, EBPVD, and EPVD are derived, each employing different methods to achieve specific coating characteristics.

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