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Electroless nickel immersion gold (ENIG or ENi/IAu), also known as immersion gold (Au), chemical Ni/Au or soft gold, is a metal plating process used in the manufacture of printed circuit boards (PCBs), to avoid oxidation and improve the solderability of copper contacts and plated through-holes.
The thickness of gold plating on jewellery is noted in microns (or micro-meters). The microns of thickness determines how long the gold plating lasts with usage. The jewellery industry denotes different qualities of gold plating in the following terminology Gold flashed / Gold washed - gold layer thickness less than 0.5 micron
A surface plating of blue gold on karat gold or sterling silver can be achieved by a gold plating of the surface, followed by indium plating, with layer thickness matching the 1:2 atomic ratio. A heat treatment then causes interdiffusion of the metals and formation of the required intermetallic compound.
Electroless nickel plating, covered by a thin layer of gold, is used in the manufacture of printed circuit boards (PCBs), to avoid oxidation and improving the solderability of copper contacts and plated through holes and vias. The gold is typically applied by quick immersion in a solution containing gold salts.
With technological advancement deposits up to .025" have been achieved and retained uniformity. Disadvantages compared to tank plating can include greater operator involvement (tank plating can frequently be done with minimal attention and the solutions used are often toxic), and the inconsistency in achieving as great a plate thickness.
The Federal Trade Commission allows the use of the terms "rolled gold plate," "R.G.P" or "gold overlay" on items with lower thicknesses of gold than are required for "gold-filled." [ 3 ] An example would be an item stamped as " 1 ⁄ 40 10kt RGP" meaning that the object is plated with 10kt gold at a thickness that makes weight of the plated ...
Electroless deposition is an important process in the electronic industry for metallization of substrates. Other metallization of substrates also include physical vapor deposition (PVD), chemical vapor deposition (CVD), and electroplating which produce thin metal films but require high temperature, vacuum, and a power source respectively. [20]
The thickness of the barrier films is also quite important; with too thin a barrier layer, the inner copper may contact and poison the very devices that they supply with energy and information; with barrier layers too thick, these wrapped stacks of two barrier metal films and an inner copper conductor can have a greater total resistance than ...