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Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.
An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
IBA (Ion Beam Applications SA) is a medical technology company based in Louvain-la-Neuve. The company was founded in 1986 by Yves Jongen within the Cyclotron Research Center of the University of Louvain (UCLouvain) and became a university spin-off. It employs about 1500 people in 40 locations. [1]
The best overall candidate is the 35 Cl ion beam; although, 79 Br would give better sensitivity by one order of magnitude compared to the 35 Cl ion beam. The mass resolution, of the detector at θ= 0° , of thin samples is ΔM/Δx ~ 0.3 amu/1000 Angstroms of the profile width.
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2] In the ion source ...
This temperature-dependence is a manifestation of incident ion beams effectively imparting the target species-dependent activation energy to the barrier layer. [3] Ballistic ion beam mixing can be classified into two basic subtypes, recoil mixing and cascade mixing, which take place simultaneously as a result of ion bombardment.
Ion Gun, used to direct a beam of ions at a target sample. An electron ionization ion source is typically used to ionize noble gas atoms such as He, Ne or Ar, while heating of wafers containing alkali atoms is used to create an alkali ion beam. The ions thus created hold a positive charge, typically +1, due to the ejection of electrons from the ...
Gas cluster ion beams (GCIB) is a technology for nano-scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage.