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2. Physical vapor deposition - Wikipedia

   en.wikipedia.org/wiki/Physical_vapor_deposition

   Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

3. Sputter deposition - Wikipedia

   en.wikipedia.org/wiki/Sputter_deposition

   Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. [1] [2]

4. Electron-beam physical vapor deposition - Wikipedia

   en.wikipedia.org/wiki/Electron-beam_physical...

   The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm / min at relatively low substrate temperatures, with very high material utilization efficiency.

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6. Pulsed laser deposition - Wikipedia

   en.wikipedia.org/wiki/Pulsed_laser_deposition

   A plume ejected from a SrRuO 3 target during pulsed laser deposition. One possible configuration of a PLD deposition chamber. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.

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   www.aol.com/best-fintech-stock-invest-1...

   According to a report from Boston Consulting Group and QED Investors, it could be worth $1.5 trillion by 2030 -- up from $245 billion in 2021. The fintech space is becoming increasingly ...