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Neon tubes may partially burn out, and a conservator may identify the burned out portion of a neon artwork through use of a neon light tester, also known as a test light or voltage tester. This electronic test device is used to determine whether an electric current is running through the equipment being tested.
Material processing: cutting, welding, marking; nonlinear fiber optics: broadband fiber-nonlinearity based sources, pump for fiber Raman lasers; distributed Raman amplification pump for telecommunications. Holmium YAG (Ho:YAG) laser 2.1 μm Flashlamp, laser diode Tissue ablation, kidney stone removal, dentistry. Chromium ZnSe (Cr:ZnSe) laser
A helium–neon laser demonstration. The glow running through the center of the tube is an electric discharge. This glowing plasma is the gain medium for the laser. The laser produces a tiny, intense spot on the screen to the right. The center of the spot appears white because the image is overexposed there. Spectrum of a helium–neon laser.
Helium–neon laser at the University of Chemnitz, Germany. A helium–neon laser or He–Ne laser is a type of gas laser whose high energetic gain medium consists of a mixture of helium and neon (ratio between 5:1 and 20:1) at a total pressure of approximately 1 Torr (133 Pa) inside a small electrical discharge.
A General Electric NE-34 glow lamp, manufactured circa 1930. Neon was discovered in 1898 by William Ramsay and Morris Travers.The characteristic, brilliant red color that is emitted by gaseous neon when excited electrically was noted immediately; Travers later wrote, "the blaze of crimson light from the tube told its own story and was a sight to dwell upon and never forget."
Neon is a colorless, odorless, inert monatomic gas under standard conditions, with approximately two-thirds the density of air. Neon was discovered in 1898 alongside krypton and xenon, identified as one of the three remaining rare inert elements in dry air after the removal of nitrogen, oxygen, argon, and carbon dioxide.
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
An excimer laser. An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining.
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