enow.com Web Search

Search results

  1. Results from the WOW.Com Content Network
  2. Electroplating - Wikipedia

    en.wikipedia.org/wiki/Electroplating

    The pulse electroplating or pulse electrodeposition (PED) process involves the swift alternating of the electrical potential or current between two different values, resulting in a series of pulses of equal amplitude, duration, and polarity, separated by zero current. By changing the pulse amplitude and width, it is possible to change the ...

  3. Localized pulsed electrodeposition - Wikipedia

    en.wikipedia.org/wiki/Localized_pulsed...

    When the nozzle approaches the substrate, the meniscus is formed at the nozzle tip, and functions as a confined electrodeposition bath. A two-electrode configuration was employed for the L-PED process, consists of a working electrode (the substrate) and a counter electrode (a metal wire which is inserted within the micropipette).

  4. Power electronic substrate - Wikipedia

    en.wikipedia.org/wiki/Power_electronic_substrate

    The role of the substrate in power electronics is to provide the interconnections to form an electric circuit (like a printed circuit board), and to cool the components. Compared to materials and techniques used in lower power microelectronics , these substrates must carry higher currents and provide a higher voltage isolation (up to several ...

  5. Copper electroplating - Wikipedia

    en.wikipedia.org/wiki/Copper_electroplating

    PCBs being fabricated in an industrial copper pattern plating line. Excluding the continuous strip plating industry, copper is the second most commonly-plated metal after nickel. [6] Copper electroplating offers a number of advantages over other plating processes, including low metal cost, high-conductivity and high-ductility bright finish, and ...

  6. Copper interconnects - Wikipedia

    en.wikipedia.org/wiki/Copper_interconnects

    The copper plating starts with coating the walls of a via with a protective layer (Ta, TaN, SiN or SiC), that prevents Cu diffusion into silicon. Then, physical vapor deposition of a thin seed Cu layer on the via walls is performed. [6] This “seed layer” servers as the promoter for the next step of electrodeposition. Normally, due to slower ...

  7. Electrophoretic deposition - Wikipedia

    en.wikipedia.org/wiki/Electrophoretic_deposition

    Electrophoretic Deposition Process. Electrophoretic deposition (EPD), is a term for a broad range of industrial processes which includes electrocoating, cathodic electrodeposition, anodic electrodeposition, and electrophoretic coating, or electrophoretic painting.

  8. Electroless deposition - Wikipedia

    en.wikipedia.org/wiki/Electroless_deposition

    Electroless deposition is an important process in the electronic industry for metallization of substrates. Other metallization of substrates also include physical vapor deposition (PVD), chemical vapor deposition (CVD), and electroplating which produce thin metal films but require high temperature, vacuum, and a power source respectively. [19]

  9. Electrogalvanization - Wikipedia

    en.wikipedia.org/wiki/Electrogalvanization

    Such Zinc electroplating or Zinc alloy electroplating maintains a dominant position among other electroplating process options, based upon electroplated tonnage per annum. According to the International Zinc Association, more than 5 million tons are used yearly for both hot dip galvanizing and electroplating. [ 1 ]