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  2. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    In semiconductor manufacturing, a mask is sometimes called a reticle. [1] [2] In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns ...

  3. Stepper - Wikipedia

    en.wikipedia.org/wiki/Stepper

    A variety of reticles, each appropriate for one stage in the process, are contained in a rack in the reticle loader, usually located at the upper front of the stepper. Before the wafer is exposed a reticle is loaded onto the reticle stage by a robot, where it is also very precisely aligned. Since the same reticle can be used to expose many ...

  4. reticle – a partial plate with holes or transparencies used in photolithography integrated circuit fabrication RDL – see redistribution layer semiconductor – a material with an electrical conductivity value falling between that of a conductor and an insulator ; its resistivity falls as its temperature rises

  5. SMIF (interface) - Wikipedia

    en.wikipedia.org/wiki/SMIF_(interface)

    Both wafers and reticles can be handled by SMIF pods in a semiconductor fabrication environment. Used in lithographic tools, reticles or photomasks contain the image that is exposed on a coated wafer in one processing step of a complete integrated semiconductor manufacturing cycle. Because reticles are linked so directly with wafer processing ...

  6. Semiconductor - Wikipedia

    en.wikipedia.org/wiki/Semiconductor

    A semiconductor is a material that is between the conductor and insulator in ability to conduct electrical current. [1] In many cases their conducting properties may be altered in useful ways by introducing impurities (" doping ") into the crystal structure .

  7. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    The workers in a semiconductor fabrication facility are required to wear cleanroom suits to protect the devices from contamination by humans. [139] To increase yield, FOUPs and semiconductor capital equipment may have a mini environment with ISO class 1 level of dust, and FOUPs can have an even cleaner micro environment.

  8. Resolution enhancement technologies - Wikipedia

    en.wikipedia.org/wiki/Resolution_enhancement...

    This process starts with the design of the IC circuitry as a series of layers than will be patterned onto the surface of a sheet of silicon or other semiconductor material known as a wafer. Each layer of the ultimate design is patterned onto a photomask , which in modern systems is made of fine lines of chromium deposited on highly purified ...

  9. Reticle - Wikipedia

    en.wikipedia.org/wiki/Reticle

    Reticle of Bell & Howell Pocket Comparator Reticle accessory (PD-8) used in sniper rifles A reticle , or reticule [ 1 ] [ 2 ] also known as a graticule , is a pattern of fine lines or markings built into the eyepiece of an optical device such as a telescopic sight , spotting scope , theodolite , optical microscope or the screen of an ...