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Xenon difluoride is a powerful fluorinating agent with the chemical formula XeF 2, and one of the most stable xenon compounds. Like most covalent inorganic fluorides it is moisture-sensitive. It decomposes on contact with water vapor, but is otherwise stable in storage. Xenon difluoride is a dense, colourless crystalline solid.
Xenon compounds are compounds containing the element xenon (Xe). After Neil Bartlett's discovery in 1962 that xenon can form chemical compounds, a large number of xenon compounds have been discovered and described. Almost all known xenon compounds contain the electronegative atoms fluorine or oxygen.
Three different xenon fluorides, ... Xenon difluoride, XeF 2; Xenon tetrafluoride, XeF 4; Xenon hexafluoride, XeF 6 This page was last edited on 28 ...
Xenon tetrafluoride crystals. The binary compounds xenon include xenon difluoride, xenon tetrafluoride, and xenon hexafluoride. [102] Xenon forms several oxyfluorides, such as xenon oxydifluoride, XeOF 2, by hydrolysis of xenon tetrafluoride. [103] Its lighter neighbor, krypton also forms well-characterized compounds, e.g., krypton difluoride.
Bartlett synthesized xenon tetrafluoride (XeF 4) by subjecting a mixture of xenon and fluorine to high temperature. [9] Rudolf Hoppe, among other groups, synthesized xenon difluoride (XeF 2) by the reaction of the elements. [10] Following the first successful synthesis of xenon compounds, synthesis of krypton difluoride (KrF 2) was reported in ...
Xenon difluoride (XeF 2) has mainly been used for radical fluorination in radical decarboxylative fluorination reactions. [12] In this Hunsdiecker -type reaction, xenon difluoride is used to generate the radical intermediate, as well as the fluorine transfer source.
The 3-center 4-electron (3c–4e) bond is a model used to explain bonding in certain hypervalent molecules such as tetratomic and hexatomic interhalogen compounds, sulfur tetrafluoride, the xenon fluorides, and the bifluoride ion.
Xenon difluoride, bromine trifluoride, chlorine trifluoride and fluorine can be used for gaseous silicon etching. [6] [7] Xenon difluoride is most commonly used to etch silicon in academia and industry, because it has a high selectivity towards other semiconductor materials, allows high process control and is easy to use at room temperature. [8 ...