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  2. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  3. High-power impulse magnetron sputtering - Wikipedia

    en.wikipedia.org/wiki/High-power_impulse...

    HIPIMS has been successfully applied for the deposition of thin films in industry, particularly on cutting tools. The first HIPIMS coating units appeared on the market in 2006. The gold version of the Apple iPhone 12 Pro uses this process on the structural stainless steel band that also serves as the device's antenna system. [22]

  4. Ion plating - Wikipedia

    en.wikipedia.org/wiki/Ion_plating

    Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a modified version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles called ions.

  5. Titanium nitride - Wikipedia

    en.wikipedia.org/wiki/Titanium_nitride

    Titanium nitride (TiN; sometimes known as tinite) is an extremely hard ceramic material, often used as a physical vapor deposition (PVD) coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.

  6. Category:Physical vapor deposition techniques - Wikipedia

    en.wikipedia.org/wiki/Category:Physical_vapor...

    Pages in category "Physical vapor deposition techniques" The following 10 pages are in this category, out of 10 total. This list may not reflect recent changes. C.

  7. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. [1] [2]

  8. Hybrid physical–chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Hybrid_physical–chemical...

    The reactor chamber of laboratory-scale hybrid physical–chemical vapor deposition (HPCVD) system at Pennsylvania State University, US. The stainless steel susceptor sits on a quartz rod inside the water-cooled chamber. During deposition, it will be heated up by the inductive heating coil (copper tubing outside

  9. Electroplating - Wikipedia

    en.wikipedia.org/wiki/Electroplating

    Chemical vapor deposition uses a gas containing a volatile compound of the metal, which gets deposited onto the substrate as a result of a chemical reaction. Gilding is a traditional way to attach a gold layer onto metals by applying a very thin sheet of gold held in place by an adhesive .

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