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In semiconductor manufacturing, the 2 nm process is the next MOSFET (metal–oxide–semiconductor field-effect transistor) die shrink after the 3 nm process node.. The term "2 nanometer", or alternatively "20 angstrom" (a term used by Intel), has no relation to any actual physical feature (such as gate length, metal pitch or gate pitch) of the transistors.
"Thou shalt not muzzle the ox when he treadeth out the corn." (Deuteronomy 25:4.) (illustration circa 1900 by James Shaw Crompton) Ki Teitzei, Ki Tetzei, Ki Tetse, Ki Thetze, Ki Tese, Ki Tetzey, or Ki Seitzei (כִּי־תֵצֵא —Hebrew for "when you go," the first words in the parashah) is the 49th weekly Torah portion (פָּרָשָׁה , parashah) in the annual Jewish cycle of ...