enow.com Web Search

Search results

  1. Results from the WOW.Com Content Network
  2. Deposition (phase transition) - Wikipedia

    en.wikipedia.org/wiki/Deposition_(phase_transition)

    For deposition to occur, thermal energy must be removed from a gas. When the air becomes cold enough, water vapour in the air surrounding a leaf loses enough thermal energy to change into a solid. Even though the air temperature may be below the dew point , the water vapour in the air alone may not condense spontaneously.

  3. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    In gas flow sputtering a working gas like argon is led through an opening in a metal subjected to a negative electrical potential. [ 15 ] [ 16 ] Enhanced plasma densities occur in the hollow cathode, if the pressure in the chamber p and a characteristic dimension L of the hollow cathode obey the Paschen's law 0.5 Pa·m < p · L < 5 Pa·m.

  4. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    PVD process flow diagram. Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from ...

  5. Atomic layer deposition - Wikipedia

    en.wikipedia.org/wiki/Atomic_layer_deposition

    There, the starting surface contains hydroxyls (OH groups) as reactive sites; Step 1 is the reaction of TMA; Step 2 is a purge or evacuation step, Step 3 is the reaction of water, and Step 4 is a purge or evacuation step. [1] Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical ...

  6. Vapor–liquid–solid method - Wikipedia

    en.wikipedia.org/wiki/Vapor–liquid–solid_method

    Au-Si droplets on the surface of the substrate act to lower the activation energy of normal vapor-solid growth. For example, Si can be deposited by means of a SiCl 4:H 2 gaseous mixture reaction (chemical vapor deposition), only at temperatures above 800 °C, in normal vapor-solid growth. Moreover, below this temperature almost no Si is ...

  7. Water vapor - Wikipedia

    en.wikipedia.org/wiki/Water_vapor

    Water vapor can also be indirect evidence supporting the presence of extraterrestrial liquid water in the case of some planetary mass objects. Water vapor, which reacts to temperature changes, is referred to as a 'feedback', because it amplifies the effect of forces that initially cause the warming. Therefore, it is a greenhouse gas. [2]

  8. Phase transition - Wikipedia

    en.wikipedia.org/wiki/Phase_transition

    When water vapor condenses (an equilibrium fractionation), the heavier water isotopes (18 O and 2 H) become enriched in the liquid phase while the lighter isotopes (16 O and 1 H) tend toward the vapor phase. [4] Phase transitions occur when the thermodynamic free energy of a system is non-analytic for some choice of thermodynamic variables (cf ...

  9. Hybrid physical–chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Hybrid_physical–chemical...

    The reactor chamber of laboratory-scale hybrid physical–chemical vapor deposition (HPCVD) system at Pennsylvania State University, US. The stainless steel susceptor sits on a quartz rod inside the water-cooled chamber. During deposition, it will be heated up by the inductive heating coil (copper tubing outside