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Fat removal procedures are used mostly in cosmetic surgery with the intention of removing unwanted adipose tissue.The procedure may be invasive, as with liposuction, [1] or noninvasive using laser therapy, radiofrequency, ultrasound or cold (cryoablation or cryolipolysis) to reduce fat, sometimes in combination with injections.
Liposuction, or simply lipo, is a type of fat-removal procedure used in plastic surgery. [1] Evidence does not support an effect on weight beyond a couple of months and does not appear to affect obesity-related problems. [2] [3] In the United States, liposuction is the most common cosmetic surgery. [4] [5]
An abdominoplasty can be combined with liposuction to make a Lipotuck, which performs body contouring around the hips, thighs, and buttocks. It can also be combined with liposuction contouring, breast reduction, breast lift, or occasionally hysterectomy, depending on the reason for the hysterectomy. A popular name for breast enhancement ...
Injection lipolysis is a controversial cosmetic procedure in which drug mixtures are injected into patients with the goal of destroying fat cells. This practice, using drugs generally based on phosphatidylcholine and deoxycholate (PCDC), evolved from the initial intravenous use of those drug formulations to treat blood disorders.
Lift-off is applied in cases where a direct etching of structural material would have undesirable effects on the layer below. Lift-off is a cheap alternative to etching in a research context, which permits a slower turn-around time. Finally, lifting off a material is an option if there is no access to an etching tool with the appropriate gases.
This is a factor of about 10 million times slower than current optical lithography tools. It is clear that throughput is a serious limitation for electron beam lithography, especially when writing dense patterns over a large area. E-beam lithography is not suitable for high-volume manufacturing because of its limited throughput.
The dry etch is then performed so that structured etching is achieved. After the process, the remaining photoresist has to be removed. This is also done in a special plasma etcher, called an asher. [14] Dry etching allows a reproducible, uniform etching of all materials used in silicon and III-V semiconductor technology. By using inductively ...
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching . RIE uses chemically reactive plasma to remove material deposited on wafers .