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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
A low-pressure mercury-vapor discharge tube floods the inside of a biosafety cabinet with shortwave UV light when not in use, killing microbes on irradiated surfaces. Ultraviolet germicidal irradiation (UVGI) is a disinfection technique employing ultraviolet (UV) light, particularly UV-C (180–280 nm), to kill or inactivate microorganisms ...
The most common device used to generate far-UVC radiation is a Krypton Chloride (KrCl) excimer lamp, which emits light at the 222 nm wavelength. Following the sudden increase in demand for disinfectant tools brought upon by the COVID-19 pandemic, a number of companies began to market and sell consumer far-UVC devices.
A portrait taken using only UV light between the wavelengths of 335 and 365 nanometers. Photographic film responds to ultraviolet radiation but the glass lenses of cameras usually block radiation shorter than 350 nm. Slightly yellow UV-blocking filters are often used for outdoor photography to prevent unwanted bluing and overexposure by UV rays.
ASML Holding N.V. (commonly shortened to ASML, originally standing for Advanced Semiconductor Materials Lithography) is a Dutch multinational corporation founded in 1984. . ASML specializes in the development and manufacturing of photolithography machines which are used to produce computer c
Extreme ultraviolet composite image of the Sun (red: 21.1 nm, green: 19.3 nm, blue: 17.1 nm) taken by the Solar Dynamics Observatory on August 1, 2010 13.5 nm extreme ultraviolet light is used commercially for photolithography as part of the semiconductor fabrication process. This image shows an early, experimental tool.
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